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Influence of helium dilution of silane on microstructure and opto-electrical properties of hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by HW-CVD
Influence of helium dilution of silane on microstructure and opto-electrical properties of hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by HW-CVD
Influence of helium dilution of silane on microstructure and opto-electrical properties of hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by HW-CVD
Waman, V. S. (Autor:in) / Kamble, M. M. (Autor:in) / Ghosh, S. S. (Autor:in) / Hawaldar, R. R. (Autor:in) / Amalnerkar, D. P. (Autor:in) / Sathe, V. G. (Autor:in) / Gosavi, S. W. (Autor:in) / Jadkar, S. R. (Autor:in)
MATERIALS RESEARCH BULLETIN ; 47 ; 3445-3451
01.01.2012
7 pages
Aufsatz (Zeitschrift)
Englisch
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