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High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates
High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates
High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates
Gu, X. (Autor:in) / Liu, Z. (Autor:in) / Gunkel, I. (Autor:in) / Chourou, S. T. (Autor:in) / Hong, S. W. (Autor:in) / Olynick, D. L. (Autor:in) / Russell, T. P. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 24 ; 5688-5694
01.01.2012
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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