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Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists
Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists
Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists
Bahlke, M. E. (Autor:in) / Mendoza, H. A. (Autor:in) / Ashall, D. T. (Autor:in) / Yin, A. S. (Autor:in) / Baldo, M. A. (Autor:in)
ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 24 ; 6136-6140
01.01.2012
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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