Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists: Fid-Bau Portal

Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists

Bahlke, M. E. / Mendoza, H. A. / Ashall, D. T. / Yin, A. S. / Baldo, M. A.

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Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists

Bahlke, M. E. / Mendoza, H. A. / Ashall, D. T. / Yin, A. S. / Baldo, M. A.

Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists

Bahlke, M. E. / Mendoza, H. A. / Ashall, D. T. / Yin, A. S. / Baldo, M. A.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Dry Lithography of Large-Area, Thin-Film Organic Semiconductors Using Frozen CO2 Resists

Contributors:

Bahlke, M. E. (author) / Mendoza, H. A. (author) / Ashall, D. T. (author) / Yin, A. S. (author) / Baldo, M. A. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 24 ; 6136-6140

Publication date:

2012-01-01

Size:

5 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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