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Influence of Substrate Temperature and Post-Annealing Treatment on the Microstructure and Electric Properties of ZnO:Al Thin Films Deposited by Sputtering
Influence of Substrate Temperature and Post-Annealing Treatment on the Microstructure and Electric Properties of ZnO:Al Thin Films Deposited by Sputtering
Influence of Substrate Temperature and Post-Annealing Treatment on the Microstructure and Electric Properties of ZnO:Al Thin Films Deposited by Sputtering
Garcia, C.B. (Autor:in) / Ariza, E. (Autor:in) / Tavares, C.J. (Autor:in) / Pinto, A.M.P. / Pouzada, A.S.
01.01.2013
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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