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Rotated Epitaxy of 3C-SiC(111) on Si(110) Substrate Using Monomethylsilane-Based Gas-Source Molecular-Beam Epitaxy
Rotated Epitaxy of 3C-SiC(111) on Si(110) Substrate Using Monomethylsilane-Based Gas-Source Molecular-Beam Epitaxy
Rotated Epitaxy of 3C-SiC(111) on Si(110) Substrate Using Monomethylsilane-Based Gas-Source Molecular-Beam Epitaxy
Sambonsuge, S. (Autor:in) / Saito, E. (Autor:in) / Jung, M.H. (Autor:in) / Fukidome, H. (Autor:in) / Filimonov, S. (Autor:in) / Suemitsu, M. (Autor:in) / Lebedev, A.A. / Davydov, S.Y. / Ivanov, P.A. / Levinshtein, M.E.
01.01.2013
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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