Characterization of critically cleaned sapphire single-crystal substrates by atomic force microscopy, XPS and contact angle measurements: Fid-Bau Portal

Characterization of critically cleaned sapphire single-crystal substrates by atomic force microscopy, XPS and contact angle measurements

Zhang, D. / Wang, Y. / Gan, Y.

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Characterization of critically cleaned sapphire single-crystal substrates by atomic force microscopy, XPS and contact angle measurements

Zhang, D. / Wang, Y. / Gan, Y.

Characterization of critically cleaned sapphire single-crystal substrates by atomic force microscopy, XPS and contact angle measurements

Zhang, D. / Wang, Y. / Gan, Y.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

Seitennavigation

Dokumentinformationen

Ähnliche Titel

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Dokumentinformationen

Titel:

Characterization of critically cleaned sapphire single-crystal substrates by atomic force microscopy, XPS and contact angle measurements

Beteiligte:

Zhang, D. (Autor:in) / Wang, Y. (Autor:in) / Gan, Y. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 274 ; 405-417

Erscheinungsdatum:

01.01.2013

Format / Umfang:

13 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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