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Effect of substrate biasing and temperature on AlN thin film deposited by cathodic arc ion
Effect of substrate biasing and temperature on AlN thin film deposited by cathodic arc ion
Effect of substrate biasing and temperature on AlN thin film deposited by cathodic arc ion
Khan, S. (Autor:in) / Mehmood, M. (Autor:in) / Saeed, S. (Autor:in) / Khan, Taj.M. (Autor:in) / Sadiq, G. (Autor:in) / Ahmed, I. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 16 ; 640-646
01.01.2013
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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