Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Development of tantalum oxynitride thin films produced by PVD: Study of structural stability
Development of tantalum oxynitride thin films produced by PVD: Study of structural stability
Development of tantalum oxynitride thin films produced by PVD: Study of structural stability
Cristea, D. (Autor:in) / Crisan, A. (Autor:in) / Barradas, N. P. (Autor:in) / Alves, E. (Autor:in) / Moura, C. (Autor:in) / Vaz, F. (Autor:in) / Cunha, L. (Autor:in) / Suzer, S. / Munteanu, D. / Vaz, F.
01.01.2013
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2018
|Infrared study of structural changes in silicon oxynitride films
British Library Online Contents | 1993
|Compact high-dielectric barium-tantalum oxynitride ceramic and preparation method thereof
Europäisches Patentamt | 2021
|High electric tunability on oxynitride perovskite LaTiO2N thin films
British Library Online Contents | 2011
|Structural analysis of silicon oxynitride films deposited by PECVD
British Library Online Contents | 2004
|