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Physical deposition of carbon doped titanium nitride film by DC magnetron sputtering for metallic implant coating use
Physical deposition of carbon doped titanium nitride film by DC magnetron sputtering for metallic implant coating use
Physical deposition of carbon doped titanium nitride film by DC magnetron sputtering for metallic implant coating use
Sedira, S. (Autor:in) / Achour, S. (Autor:in) / Avci, A. (Autor:in) / Eskizeybek, V. (Autor:in)
APPLIED SURFACE SCIENCE ; 295 ; 81-85
01.01.2014
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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