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Fabrication of 25-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Drawing, RIE and Ion-Milling
Fabrication of 25-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Drawing, RIE and Ion-Milling
Fabrication of 25-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Drawing, RIE and Ion-Milling
Mohamad, Z.b. (Autor:in) / Huda, M. (Autor:in) / Komori, T. (Autor:in) / Alip, R.I. (Autor:in) / Zhang, H. (Autor:in) / Yin, Y. (Autor:in) / Hosaka, S. (Autor:in) / Hosaka, S.
01.01.2014
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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