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Fabrication of 30-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Lithography and Ion Milling for Patterned Media
Fabrication of 30-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Lithography and Ion Milling for Patterned Media
Fabrication of 30-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Lithography and Ion Milling for Patterned Media
Mohamad, Z. (Autor:in) / Alip, R.I. (Autor:in) / Komori, T. (Autor:in) / Akahane, T. (Autor:in) / Zhang, H. (Autor:in) / Huda, M. (Autor:in) / Yin, Y. (Autor:in) / Hosaka, S. (Autor:in) / Hosaka, S.
01.01.2013
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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