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Composition, Structure and Electrical Resistivity of TiO~x Thin Films Deposited by RF Magnetron Sputtering at Varied Substrate Temperatures
Composition, Structure and Electrical Resistivity of TiO~x Thin Films Deposited by RF Magnetron Sputtering at Varied Substrate Temperatures
Composition, Structure and Electrical Resistivity of TiO~x Thin Films Deposited by RF Magnetron Sputtering at Varied Substrate Temperatures
Su, H.X. (Autor:in) / Peng, Z.J. (Autor:in) / Fu, X.L. (Autor:in) / Pan, W. / Gong, J.
01.01.2014
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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