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Composition, Structure and Electrical Resistivity of TiO~x Thin Films Deposited by RF Magnetron Sputtering at Varied Substrate Temperatures
Composition, Structure and Electrical Resistivity of TiO~x Thin Films Deposited by RF Magnetron Sputtering at Varied Substrate Temperatures
Composition, Structure and Electrical Resistivity of TiO~x Thin Films Deposited by RF Magnetron Sputtering at Varied Substrate Temperatures
Su, H.X. (author) / Peng, Z.J. (author) / Fu, X.L. (author) / Pan, W. / Gong, J.
2014-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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