Strain relaxation of epitaxial CoSi2 and SiGe layers in cap-Si/Si0.83Ge0.17/Si(001) and epi-CoSi2/Si0.83Ge0.17/Si(001) structures

Shin, D. O. / Sardela, M. R. / Ban, S. H. et al. | British Library Online Contents | 2004

CoSi2 nanostructures by writing FIB ion beam synthesis

Akhmadaliev, C. / Bischoff, L. / Schmidt, B. | British Library Online Contents | 2006

Leakage current and deep levels in CoSi2 silicided junctions

Codegoni, D. / Carnevale, G. P. / De Marco, C. et al. | British Library Online Contents | 2005

Experimental and theoretical study of the electronic properties of CoSi2 and NiSi2

Garcia-Mendez, M. / Galvan, D. H. / Posada-Amarillas, A. et al. | British Library Online Contents | 2004

Growth and characterization of CoSi2 films on Si (100) substrates

Takahashi, F. / Irie, T. / Shi, J. et al. | British Library Online Contents | 2001