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Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells
Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells
Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells
Wang, L. (Autor:in) / Zhang, X. (Autor:in) / Zhao, Y. (Autor:in) / Yamada, T. (Autor:in) / Naito, Y. (Autor:in)
APPLIED SURFACE SCIENCE ; 316 ; 508-514
01.01.2014
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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