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Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells
Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells
Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells
Wang, Li (Autor:in) / Zhang, Xiaodan (Autor:in) / Zhao, Ying (Autor:in) / Yamada, Takuto (Autor:in) / Naito, Yusuke (Autor:in)
Applied surface science ; 316 ; 508-514
01.01.2014
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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