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    Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells

    New search for: Wang, L.
    New search for: Zhang, X.
    New search for: Zhao, Y.
    New search for: Yamada, T.
    New search for: Naito, Y.

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    Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells

    New search for: Wang, L.
    New search for: Zhang, X.
    New search for: Zhao, Y.
    New search for: Yamada, T.
    New search for: Naito, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells

    New search for: Wang, L.
    New search for: Zhang, X.
    New search for: Zhao, Y.
    New search for: Yamada, T.
    New search for: Naito, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells

    Contributors:

    Wang, L. (author) / Zhang, X. (author) / Zhao, Y. (author) / Yamada, T. (author) / Naito, Y. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 316 ; 508-514

    Publication date:

    2014-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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