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Effect of Substrate Distance of Vacuum Evaporation Plating on Microstructure and Morphology of Germanium - Doped Polycrystalline Silicon Film
Effect of Substrate Distance of Vacuum Evaporation Plating on Microstructure and Morphology of Germanium - Doped Polycrystalline Silicon Film
Effect of Substrate Distance of Vacuum Evaporation Plating on Microstructure and Morphology of Germanium - Doped Polycrystalline Silicon Film
Yang, P. (Autor:in) / Wang, Z. (Autor:in) / Fu, C.-q. (Autor:in) / Zhang, Q.-l. (Autor:in)
MATERIALS PROTECTION -WUHAN- ; 47 ; 33-35
01.01.2014
3 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.1
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