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Effect of Substrate Distance of Vacuum Evaporation Plating on Microstructure and Morphology of Germanium - Doped Polycrystalline Silicon Film
Effect of Substrate Distance of Vacuum Evaporation Plating on Microstructure and Morphology of Germanium - Doped Polycrystalline Silicon Film
Effect of Substrate Distance of Vacuum Evaporation Plating on Microstructure and Morphology of Germanium - Doped Polycrystalline Silicon Film
Yang, P. (author) / Wang, Z. (author) / Fu, C.-q. (author) / Zhang, Q.-l. (author)
MATERIALS PROTECTION -WUHAN- ; 47 ; 33-35
2014-01-01
3 pages
Article (Journal)
Unknown
DDC:
620.1
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