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Vertically aligned Si nanocrystals embedded in amorphous Si matrix prepared by inductively coupled plasma chemical vapor deposition (ICP-CVD)
Vertically aligned Si nanocrystals embedded in amorphous Si matrix prepared by inductively coupled plasma chemical vapor deposition (ICP-CVD)
Vertically aligned Si nanocrystals embedded in amorphous Si matrix prepared by inductively coupled plasma chemical vapor deposition (ICP-CVD)
Nogay, G. (Autor:in) / Saleh, Z. M. (Autor:in) / Ozkol, E. (Autor:in) / Turan, R. (Autor:in)
01.01.2015
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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