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Performance improvement of GaN-based HEMT grown on silicon (111) substrate by inserting low temperature AlN layer
Performance improvement of GaN-based HEMT grown on silicon (111) substrate by inserting low temperature AlN layer
Performance improvement of GaN-based HEMT grown on silicon (111) substrate by inserting low temperature AlN layer
Lin, J. H. (Autor:in) / Huang, S. J. (Autor:in) / Su, Y. K. (Autor:in) / Lai, C. H. (Autor:in)
APPLIED SURFACE SCIENCE ; 354 ; 148-154
01.01.2015
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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