Nanoscale characterization of CH3-terminated Self-Assembled Monolayer on copper by advanced scanning probe microscopy techniques: Fid-Bau Portal

Nanoscale characterization of CH3-terminated Self-Assembled Monolayer on copper by advanced scanning probe microscopy techniques

Berthold, T. / Benstetter, G. / Frammelsberger, W. / Rodríguez, R. / Nafría, M.

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Nanoscale characterization of CH3-terminated Self-Assembled Monolayer on copper by advanced scanning probe microscopy techniques

Berthold, T. / Benstetter, G. / Frammelsberger, W. / Rodríguez, R. / Nafría, M.

Nanoscale characterization of CH3-terminated Self-Assembled Monolayer on copper by advanced scanning probe microscopy techniques

Berthold, T. / Benstetter, G. / Frammelsberger, W. / Rodríguez, R. / Nafría, M.

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Titel:

Nanoscale characterization of CH3-terminated Self-Assembled Monolayer on copper by advanced scanning probe microscopy techniques

Beteiligte:

Berthold, T. (Autor:in) / Benstetter, G. (Autor:in) / Frammelsberger, W. (Autor:in) / Rodríguez, R. (Autor:in) / Nafría, M. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 356 ; 921-926

Erscheinungsdatum:

01.01.2015

Format / Umfang:

6 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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