Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Effect of substrate roughness and working pressure on photocatalyst of N-doped TiOx films prepared by reactive sputtering with air
Effect of substrate roughness and working pressure on photocatalyst of N-doped TiOx films prepared by reactive sputtering with air
Effect of substrate roughness and working pressure on photocatalyst of N-doped TiOx films prepared by reactive sputtering with air
Lee, S. H. (Autor:in) / Yamasue, E. (Autor:in) / Okumura, H. (Autor:in) / Ishihara, K. N. (Autor:in)
APPLIED SURFACE SCIENCE ; 324 ; 339-348
01.01.2015
10 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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