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Effect of substrate roughness and working pressure on photocatalyst of N-doped TiOx films prepared by reactive sputtering with air
Effect of substrate roughness and working pressure on photocatalyst of N-doped TiOx films prepared by reactive sputtering with air
Effect of substrate roughness and working pressure on photocatalyst of N-doped TiOx films prepared by reactive sputtering with air
Lee, S. H. (author) / Yamasue, E. (author) / Okumura, H. (author) / Ishihara, K. N. (author)
APPLIED SURFACE SCIENCE ; 324 ; 339-348
2015-01-01
10 pages
Article (Journal)
English
DDC:
621.35
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