Effect of substrate roughness and working pressure on photocatalyst of N-doped TiOx films prepared by reactive sputtering with air

Lee, S. H. / Yamasue, E. / Okumura, H. et al. | British Library Online Contents | 2015

Preparation of molybdenum-doped indium oxide thin films using reactive direct-current magnetron sputtering

Li, X. / Miao, W. / Zhang, Q. et al. | British Library Online Contents | 2005

La-doped Copper Nitride Films Prepared by Reactive Magnetron Sputtering

Li, X. / Yang, J. / Zuo, A. et al. | British Library Online Contents | 2009

Formation of Al-doped ZnO films by dc magnetron reactive sputtering

Chen, M. / Pei, Z. L. / Sun, C. et al. | British Library Online Contents | 2001

Transparent conductive Tb-doped ZnO films prepared by rf reactive magnetron sputtering

Fang, Z. B. / Tan, Y. S. / Gong, H. X. et al. | British Library Online Contents | 2005