Growth of (111)-oriented epitaxial magnesium silicide (Mg2Si) films on (001) Al2O3 substrates by RF magnetron sputtering and their properties: Fid-Bau Portal

Growth of (111)-oriented epitaxial magnesium silicide (Mg2Si) films on (001) Al2O3 substrates by RF magnetron sputtering and their properties

Katagiri, A. / Ogawa, S. / Uehara, M. / Sankara Rama Krishnan, P. S. / Kurokawa, M. / Matsushima, M. / Shimizu, T. / Akiyama, K. / Funakubo, H.

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Growth of (111)-oriented epitaxial magnesium silicide (Mg2Si) films on (001) Al2O3 substrates by RF magnetron sputtering and their properties

Katagiri, A. / Ogawa, S. / Uehara, M. / Sankara Rama Krishnan, P. S. / Kurokawa, M. / Matsushima, M. / Shimizu, T. / Akiyama, K. / Funakubo, H.

Growth of (111)-oriented epitaxial magnesium silicide (Mg2Si) films on (001) Al2O3 substrates by RF magnetron sputtering and their properties

Katagiri, A. / Ogawa, S. / Uehara, M. / Sankara Rama Krishnan, P. S. / Kurokawa, M. / Matsushima, M. / Shimizu, T. / Akiyama, K. / Funakubo, H.

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Titel:

Growth of (111)-oriented epitaxial magnesium silicide (Mg2Si) films on (001) Al2O3 substrates by RF magnetron sputtering and their properties

Beteiligte:

Katagiri, A. (Autor:in) / Ogawa, S. (Autor:in) / Uehara, M. (Autor:in) / Sankara Rama Krishnan, P. S. (Autor:in) / Kurokawa, M. (Autor:in) / Matsushima, M. (Autor:in) / Shimizu, T. (Autor:in) / Akiyama, K. (Autor:in) / Funakubo, H. (Autor:in)

Erschienen in:

JOURNAL OF MATERIALS SCIENCE ; 53 ; 5151-5158

Erscheinungsdatum:

01.01.2018

Format / Umfang:

8 pages

ISSN:

0022-2461

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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