Effects of magnesium film thickness and annealing temperature on formation of Mg2Si films on silicon (111) substrate deposited by magnetron sputtering: Fid-Bau Portal

Effects of magnesium film thickness and annealing temperature on formation of Mg2Si films on silicon (111) substrate deposited by magnetron sputtering

Xiao, Q. / Xie, Q. / Shen, X. / Zhang, J. / Yu, Z. / Zhao, K.

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Effects of magnesium film thickness and annealing temperature on formation of Mg2Si films on silicon (111) substrate deposited by magnetron sputtering

Xiao, Q. / Xie, Q. / Shen, X. / Zhang, J. / Yu, Z. / Zhao, K.

Effects of magnesium film thickness and annealing temperature on formation of Mg2Si films on silicon (111) substrate deposited by magnetron sputtering

Xiao, Q. / Xie, Q. / Shen, X. / Zhang, J. / Yu, Z. / Zhao, K.

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Bestellung bei Subito €

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Titel:

Effects of magnesium film thickness and annealing temperature on formation of Mg2Si films on silicon (111) substrate deposited by magnetron sputtering

Beteiligte:

Xiao, Q. (Autor:in) / Xie, Q. (Autor:in) / Shen, X. (Autor:in) / Zhang, J. (Autor:in) / Yu, Z. (Autor:in) / Zhao, K. (Autor:in)

Erschienen in:

APPLIED SURFACE SCIENCE ; 257 ; 7800-7804

Erscheinungsdatum:

01.01.2011

Format / Umfang:

5 pages

ISSN:

0169-4332

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 621.35

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