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First-principles investigation of defects at GaAs/oxide interfaces
First-principles investigation of defects at GaAs/oxide interfaces
First-principles investigation of defects at GaAs/oxide interfaces
Houssa, M. (Autor:in) / Iordanidou, K. (Autor:in) / Afanas’ev, V.V. (Autor:in) / Stesmans, A. (Autor:in)
Materials science in semiconductor processing ; 42 ; 239-241
01.01.2016
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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