A platform for research: civil engineering, architecture and urbanism
First-principles investigation of defects at GaAs/oxide interfaces
First-principles investigation of defects at GaAs/oxide interfaces
First-principles investigation of defects at GaAs/oxide interfaces
Houssa, M. (author) / Iordanidou, K. (author) / Afanas’ev, V.V. (author) / Stesmans, A. (author)
Materials science in semiconductor processing ; 42 ; 239-241
2016-01-01
3 pages
Article (Journal)
English
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
First Principles Investigation of Vacancy Oxygen Defects in Si
British Library Online Contents | 1995
|First-Principles Calculations of Metal/Oxide Interfaces: Effects of Interface Stoichiometry
British Library Online Contents | 2005
|First-Principles Study of Molecule/Al Interfaces
British Library Online Contents | 2006
|First Principles Simulations of SiC-Based Interfaces
British Library Online Contents | 2005
|First-principles calculations on Mg/TiB2 interfaces
British Library Online Contents | 2018
|