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Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation
Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation
Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation
Lebedev, Mikhail V. (Autor:in) / Kalyuzhnyy, Nikolay A. (Autor:in) / Mintairov, Sergey A. (Autor:in) / Calvet, Wolfram (Autor:in) / Kaiser, Bernhard (Autor:in) / Jaegermann, Wolfram (Autor:in)
Materials science in semiconductor processing ; 51 ; 81-88
01.01.2016
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation
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