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    Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation

    New search for: Lebedev, Mikhail V.
    New search for: Kalyuzhnyy, Nikolay A.
    New search for: Mintairov, Sergey A.
    New search for: Calvet, Wolfram
    New search for: Kaiser, Bernhard
    New search for: Jaegermann, Wolfram

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    Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation

    New search for: Lebedev, Mikhail V.
    New search for: Kalyuzhnyy, Nikolay A.
    New search for: Mintairov, Sergey A.
    New search for: Calvet, Wolfram
    New search for: Kaiser, Bernhard
    New search for: Jaegermann, Wolfram

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation

    New search for: Lebedev, Mikhail V.
    New search for: Kalyuzhnyy, Nikolay A.
    New search for: Mintairov, Sergey A.
    New search for: Calvet, Wolfram
    New search for: Kaiser, Bernhard
    New search for: Jaegermann, Wolfram

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
    Title:

    Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation

    Contributors:

    Lebedev, Mikhail V. (author) / Kalyuzhnyy, Nikolay A. (author) / Mintairov, Sergey A. (author) / Calvet, Wolfram (author) / Kaiser, Bernhard (author) / Jaegermann, Wolfram (author)

    Published in:

    Materials science in semiconductor processing ; 51 ; 81-88

    Publication date:

    2016-01-01

    Size:

    8 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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