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Formation and characterization of porous silicon films obtained by catalyzed vapor-chemical etching
Formation and characterization of porous silicon films obtained by catalyzed vapor-chemical etching
Formation and characterization of porous silicon films obtained by catalyzed vapor-chemical etching
Díaz-Torres, E. (Autor:in) / Romero-Paredes, G. (Autor:in) / Peña-Sierra, R. (Autor:in) / Ávila-García, A. (Autor:in)
Materials science in semiconductor processing ; 40 ; 533-538
01.01.2015
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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