Characterization of polycrystalline silicon carbide films grown by atmospheric pressure chemical vapor deposition on polycrystalline silicon

Zorman, C. A. / Roy, S. / Wu, C.-H. et al. | British Library Online Contents | 1998

Large grain polycrystalline silicon via chemical vapor deposition

Beckloff, B. N. / Lackey, W. J. / Pickering, E. M. | British Library Online Contents | 1999

Epitaxial nucleation of polycrystalline silicon carbide during chemical vapor deposition

Sheldon, B. W. / Besmann, T. M. / More, K. L. et al. | British Library Online Contents | 1993

Preferred Orientation of Chemical Vapor Deposited Polycrystalline Silicon Carbide Films

Kajikawa, Y. / Noda, S. / Komiyama, H. | British Library Online Contents | 2002

Polycrystalline silicon film formation at low temperature using ultra-high-frequency plasma enhanced chemical vapor deposition

Mebarki, B. / Sumiya, S. / Yoshida, R. et al. | British Library Online Contents | 1999