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High power impulse magnetron sputtered p-type γ-titanium monoxide films: Effects of substrate bias and post-annealing on microstructure characteristics and optoelectrical properties
High power impulse magnetron sputtered p-type γ-titanium monoxide films: Effects of substrate bias and post-annealing on microstructure characteristics and optoelectrical properties
High power impulse magnetron sputtered p-type γ-titanium monoxide films: Effects of substrate bias and post-annealing on microstructure characteristics and optoelectrical properties
Peng, Wu-Chang (Autor:in) / Chen, Ying-Hung (Autor:in) / Chen, Jing-Yu (Autor:in) / He, Ju-Liang (Autor:in) / Wuu, Dong-Sing (Autor:in)
Materials science in semiconductor processing ; 61 ; 85-92
01.01.2017
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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