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Properties of Reactive Magnetron Sputtered ITO Films without in-situ Substrate Heating and Post-deposition Annealing
Properties of Reactive Magnetron Sputtered ITO Films without in-situ Substrate Heating and Post-deposition Annealing
Properties of Reactive Magnetron Sputtered ITO Films without in-situ Substrate Heating and Post-deposition Annealing
JOURNAL OF MATERIALS SCIENCE AND TECHNOLOGY -SHENYANG- ; 16 ; 281-285
01.01.2000
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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