Nd3+-doped colloidal SiO2 composite abrasives: Synthesis and the effects on chemical mechanical polishing (CMP) performances of sapphire wafers

Liu, Tingting / Lei, Hong | British Library Online Contents | 2017

Planarization machining of sapphire wafers with boron carbide and colloidal silica as abrasives

Hu, X. / Song, Z. / Pan, Z. et al. | British Library Online Contents | 2009

Chemical-Mechanical Polishing of Wafers with Copper Film by Nano-Scale Abrasives

Tsai, J.C. / Kao, J.F. | British Library Online Contents | 2008

Machining Mechanisms of Si Wafers in Mechanochemical Polishing by Soft Abrasives

Yasunaga, N. | British Library Online Contents | 2005

Effects of mixed abrasives in chemical mechanical polishing of oxide films

Lu, Z. / Lee, S.-H. / Gorantla, V. R. K. et al. | British Library Online Contents | 2003