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Homogeneous transfer of graphene oxide into photoresist: Fabrication of high surface area three-dimensional micro-arrays by modified photolithography
Homogeneous transfer of graphene oxide into photoresist: Fabrication of high surface area three-dimensional micro-arrays by modified photolithography
Homogeneous transfer of graphene oxide into photoresist: Fabrication of high surface area three-dimensional micro-arrays by modified photolithography
Xue, Bing (Autor:in) / Zou, Yingquan (Autor:in)
Composites science and technology ; 157 ; 78-85
01.01.2018
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.118
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