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    Homogeneous transfer of graphene oxide into photoresist: Fabrication of high surface area three-dimensional micro-arrays by modified photolithography

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    Homogeneous transfer of graphene oxide into photoresist: Fabrication of high surface area three-dimensional micro-arrays by modified photolithography

    New search for: Xue, Bing
    New search for: Zou, Yingquan

    Access

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    Check availability in my library
    Order at Subito €

    Homogeneous transfer of graphene oxide into photoresist: Fabrication of high surface area three-dimensional micro-arrays by modified photolithography

    New search for: Xue, Bing
    New search for: Zou, Yingquan

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Title:

    Homogeneous transfer of graphene oxide into photoresist: Fabrication of high surface area three-dimensional micro-arrays by modified photolithography

    Contributors:

    Xue, Bing (author) / Zou, Yingquan (author)

    Published in:

    Composites science and technology ; 157 ; 78-85

    Publication date:

    2018-01-01

    Size:

    8 pages

    ISSN:

    0266-3538

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.118

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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