Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Unintentional carbide formation evidenced during high-vacuum magnetron sputtering of transition metal nitride thin films
Unintentional carbide formation evidenced during high-vacuum magnetron sputtering of transition metal nitride thin films
Unintentional carbide formation evidenced during high-vacuum magnetron sputtering of transition metal nitride thin films
Greczynski, G. (Autor:in) / Mráz, S. (Autor:in) / Hultman, L. (Autor:in) / Schneider, J.M. (Autor:in)
Applied surface science ; 385 ; 356-359
01.01.2016
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
| British Library Online Contents | 2016
Effect of Vacuum Magnetron Sputtering Parameters on Corrosion Resistance of Zirconium Nitride Films
| British Library Online Contents | 2012
Ti nitride phases in thin films deposited by DC magnetron sputtering
| British Library Online Contents | 1996
Preparation of silicon carbide nitride thin films by sputtering of silicon nitride target
| British Library Online Contents | 2001
Microstresses in Molybdenum Nitride Thin Films Deposited by Reactive DC Magnetron Sputtering
| British Library Online Contents | 2005