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    Unintentional carbide formation evidenced during high-vacuum magnetron sputtering of transition metal nitride thin films

    New search for: Greczynski, G.
    New search for: Mráz, S.
    New search for: Hultman, L.
    New search for: Schneider, J.M.

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    Unintentional carbide formation evidenced during high-vacuum magnetron sputtering of transition metal nitride thin films

    New search for: Greczynski, G.
    New search for: Mráz, S.
    New search for: Hultman, L.
    New search for: Schneider, J.M.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Unintentional carbide formation evidenced during high-vacuum magnetron sputtering of transition metal nitride thin films

    New search for: Greczynski, G.
    New search for: Mráz, S.
    New search for: Hultman, L.
    New search for: Schneider, J.M.

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Title:

    Unintentional carbide formation evidenced during high-vacuum magnetron sputtering of transition metal nitride thin films

    Contributors:

    Greczynski, G. (author) / Mráz, S. (author) / Hultman, L. (author) / Schneider, J.M. (author)

    Published in:

    Applied surface science ; 385 ; 356-359

    Publication date:

    2016-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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