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Atomistic mechanisms of Si chemical mechanical polishing in aqueous H2O2: ReaxFF reactive molecular dynamics simulations
Atomistic mechanisms of Si chemical mechanical polishing in aqueous H2O2: ReaxFF reactive molecular dynamics simulations
Atomistic mechanisms of Si chemical mechanical polishing in aqueous H2O2: ReaxFF reactive molecular dynamics simulations
Wen, Jialin (author) / Ma, Tianbao (author) / Zhang, Weiwei (author) / van Duin, Adri C.T. (author) / Lu, Xinchun (author)
Computational materials science ; 131 ; 230-238
2017-01-01
9 pages
Article (Journal)
Unknown
DDC:
620.1
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