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Temperature-dependent microstructural evolution of Ti2AlN thin films deposited by reactive magnetron sputtering
Temperature-dependent microstructural evolution of Ti2AlN thin films deposited by reactive magnetron sputtering
Temperature-dependent microstructural evolution of Ti2AlN thin films deposited by reactive magnetron sputtering
Zhang, Zheng (Autor:in) / Jin, Hongmei (Autor:in) / Chai, Jianwei (Autor:in) / Pan, Jisheng (Autor:in) / Seng, Hwee Leng (Autor:in) / Goh, Glen Tai Wei (Autor:in) / Wong, Lai Mun (Autor:in) / Sullivan, Michael B. (Autor:in) / Wang, Shi Jie (Autor:in)
Applied surface science ; 368 ; 88-96
01.01.2016
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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