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    Temperature-dependent microstructural evolution of Ti2AlN thin films deposited by reactive magnetron sputtering

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    Temperature-dependent microstructural evolution of Ti2AlN thin films deposited by reactive magnetron sputtering

    New search for: Zhang, Zheng
    New search for: Jin, Hongmei
    New search for: Chai, Jianwei
    New search for: Pan, Jisheng
    New search for: Seng, Hwee Leng
    New search for: Goh, Glen Tai Wei
    New search for: Wong, Lai Mun
    New search for: Sullivan, Michael B.
    New search for: Wang, Shi Jie

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Temperature-dependent microstructural evolution of Ti2AlN thin films deposited by reactive magnetron sputtering

    New search for: Zhang, Zheng
    New search for: Jin, Hongmei
    New search for: Chai, Jianwei
    New search for: Pan, Jisheng
    New search for: Seng, Hwee Leng
    New search for: Goh, Glen Tai Wei
    New search for: Wong, Lai Mun
    New search for: Sullivan, Michael B.
    New search for: Wang, Shi Jie

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
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    Document information
    Title:

    Temperature-dependent microstructural evolution of Ti2AlN thin films deposited by reactive magnetron sputtering

    Contributors:

    Zhang, Zheng (author) / Jin, Hongmei (author) / Chai, Jianwei (author) / Pan, Jisheng (author) / Seng, Hwee Leng (author) / Goh, Glen Tai Wei (author) / Wong, Lai Mun (author) / Sullivan, Michael B. (author) / Wang, Shi Jie (author)

    Published in:

    Applied surface science ; 368 ; 88-96

    Publication date:

    2016-01-01

    Size:

    9 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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