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Electrical properties of epitaxial Lu- or Y-doped La2O3/La2O3/Ge high-k gate-stacks
Electrical properties of epitaxial Lu- or Y-doped La2O3/La2O3/Ge high-k gate-stacks
Electrical properties of epitaxial Lu- or Y-doped La2O3/La2O3/Ge high-k gate-stacks
Kanashima, T. (Autor:in) / Yamashiro, R. (Autor:in) / Zenitaka, M. (Autor:in) / Yamamoto, K. (Autor:in) / Wang, D. (Autor:in) / Tadano, J. (Autor:in) / Yamada, S. (Autor:in) / Nohira, H. (Autor:in) / Nakashima, H. (Autor:in) / Hamaya, K. (Autor:in)
Materials science in semiconductor processing ; 70 ; 260-264
01.01.2017
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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