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Low-temperature amorphous boron nitride on Si0.7Ge0.3(001), Cu, and HOPG from sequential exposures of N2H4 and BCl3
Low-temperature amorphous boron nitride on Si0.7Ge0.3(001), Cu, and HOPG from sequential exposures of N2H4 and BCl3
Low-temperature amorphous boron nitride on Si0.7Ge0.3(001), Cu, and HOPG from sequential exposures of N2H4 and BCl3
Wolf, Steven (Autor:in) / Edmonds, Mary (Autor:in) / Sardashti, Kasra (Autor:in) / Clemons, Max (Autor:in) / Park, Jun Hong (Autor:in) / Yoshida, Naomi (Autor:in) / Dong, Lin (Autor:in) / Nemani, Srinivas (Autor:in) / Yieh, Ellie (Autor:in) / Holmes, Russell (Autor:in)
Applied surface science ; 439 ; 689-696
01.01.2018
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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