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TiO2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation
TiO2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation
TiO2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation
Wang, Hui (Autor:in) / Li, Yujie (Autor:in) / Ba, Xin (Autor:in) / Huang, Lin (Autor:in) / Yu, Ying (Autor:in)
Applied surface science ; 345 ; 49-56
01.01.2015
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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