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TiO2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation
TiO2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation
TiO2 thin films with rutile phase prepared by DC magnetron co-sputtering at room temperature: Effect of Cu incorporation
Wang, Hui (author) / Li, Yujie (author) / Ba, Xin (author) / Huang, Lin (author) / Yu, Ying (author)
Applied surface science ; 345 ; 49-56
2015-01-01
8 pages
Article (Journal)
English
DDC:
620.44
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