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    Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells

    New search for: Wang, Li
    New search for: Zhang, Xiaodan
    New search for: Zhao, Ying
    New search for: Yamada, Takuto
    New search for: Naito, Yusuke

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    Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells

    New search for: Wang, Li
    New search for: Zhang, Xiaodan
    New search for: Zhao, Ying
    New search for: Yamada, Takuto
    New search for: Naito, Yusuke

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells

    New search for: Wang, Li
    New search for: Zhang, Xiaodan
    New search for: Zhao, Ying
    New search for: Yamada, Takuto
    New search for: Naito, Yusuke

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Investigation of H2/CH4 mixed gas plasma post-etching process for ZnO:B front contacts grown by LP-MOCVD method in silicon-based thin-film solar cells

    Contributors:

    Wang, Li (author) / Zhang, Xiaodan (author) / Zhao, Ying (author) / Yamada, Takuto (author) / Naito, Yusuke (author)

    Published in:

    Applied surface science ; 316 ; 508-514

    Publication date:

    2014-01-01

    Size:

    7 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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