Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Electrical evaluation of crack generation in SiNx and SiOxNy thin-film encapsulation layers for OLED displays
Electrical evaluation of crack generation in SiNx and SiOxNy thin-film encapsulation layers for OLED displays
Electrical evaluation of crack generation in SiNx and SiOxNy thin-film encapsulation layers for OLED displays
Park, Eun Kil (Autor:in) / Kim, Sungmin (Autor:in) / Heo, Jaeyeong (Autor:in) / Kim, Hyeong Joon (Autor:in)
Applied surface science ; 370 ; 126-130
01.01.2016
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2016
|British Library Online Contents | 2016
|Quantitative depth profiling of SiOxNy layers on Si
British Library Online Contents | 2003
|Electrical behaviour of SiOxNy thin films and correlation with structural defects
British Library Online Contents | 2006
|Low temperature PECVD SiNx films applied in OLED packaging
British Library Online Contents | 2003
|